Company

TrueNano, Inc. is an R&D company located in Westminster, CO. It develops a select number of semiconductor-based material and device technologies for efficient power convertors, invertors, and variable frequency converters. Applications include electric vehicles, solar invertors, and a wide range of electrified electromechanical systems.


Technology

TrueNano Inc. is developing cost effective cubic silicon carbide (3C-SiC) epi-layers and wafers using its patented Hot Filament Chemical Vapor Deposition process (HFCVD). HFCVD has all the advantages of a CVD process (low cost precursors and continuous growth) and additional degrees of freedom from the hot filament. The filaments precondition the gases, thereby enhancing the reactivity of the precursors. The independent temperature control allows for lower growth temperatures while maintaining high growth rate and low defect density, especially on non-native substrates. It also allows for control of the thermal gradients thus minimizing the strain in the layer, especially on non-native substrates.


News

11/13/2019 - TrueNano, Inc. has been awarded a Navy Phase II STTR grant aimed at the growth of Silicon Carbide on 6 and 8 inch substrates. This work will be performed in collaboration with the University of Colorado, Boulder.

09/30/2019 - TrueNano, Inc. in collaboration with the University of Colorado, Boulder presented a paper entitled "Analysis of Defect-Free Hot Filament CVD-grown 3C-SiC". .

04/18/2018 - TrueNano, Inc. has been awarded a Navy Phase I STTR grant aimed at the growth of Silicon Carbide on 6 and 8 inch substrates.


Contact

TrueNano, Inc. Westminster
10850 Dover St. Suite 500
Westminster, CO 80021
USA

Tel: (303) 284-4265
Fax: (303) 284-4265

info@truenano.com