Description |
Symbol |
MKS Units |
|
Acceptor doping density |
Na |
m-3 |
|
Acceptor energy |
Ea |
Joule |
|
Applied voltage |
Va |
V |
|
Area |
A |
m2 |
|
Barrier height |
φB |
V |
|
Base doping density |
NB |
m-3 |
|
Base voltage |
VB |
V |
|
Base width |
wB |
m |
|
Body effect parameter |
γ |
V1/2 |
|
Boltzmann's constant |
k |
J/K |
|
Built-in potential of a p-n diode or Schottky diode |
φi |
V |
|
Bulk potential |
φF |
V |
|
Capacitance per unit area |
C |
F/m2 |
|
Charge |
Q |
C |
|
Charge density per unit area at threshold in the depletion layer of an MOS structure |
Qd,T |
C/m2 |
|
Charge density per unit area in the depletion layer of an MOS structure |
Qd |
C/m2 |
|
Charge density per unit volume |
ρ |
C/m3 |
|
Charge density per unit volume in the oxide |
ρox |
C/m3 |
|
Collector doping density |
NC |
m-3 |
|
Collector voltage |
VC |
V |
|
Collector width |
wC |
m |
|
Conduction band energy of a semiconductor |
Ec |
Joule |
|
Conductivity |
σ |
Ω-1m-1 |
|
Current |
I |
A |
|
Current density |
J |
A/m2 |
|
Current gain |
β |
|
|
Density of states in the conduction band per unit energy and per unit volume |
gc(E) |
m-3J-1 |
|
Density of states in the valence band per unit energy and per unit volume |
gv(E) |
m-3J-1 |
|
Depletion layer width |
w |
m |
|
Depletion layer width in a p-type semiconductor |
xp |
m |
|
Depletion layer width in an MOS structure |
xd |
m |
|
Depletion layer width in an MOS structure at threshold |
xd,T |
m |
|
Depletion layer width in an n-type semiconductor |
xn |
m |
|
Dielectric constant of the oxide |
εox |
F/m |
|
Dielectric constant of the semiconductor |
εs |
F/m |
|
Distribution function (probability density function) |
f(E) |
|
|
Donor doping density |
Nd |
m-3 |
|
Donor energy |
Ed |
Joule |
|
Doping density |
N |
|
|
Drain voltage |
VD |
V |
|
Effective density of states in the conduction band |
Nc |
m-3 |
|
Effective density of states in the valence band |
Nv |
m-3 |
|
Effective mass of electrons |
me* |
kg |
|
Effective mass of holes |
mh* |
kg |
|
Electric field |
E |
V/m |
|
Electron affinity of the semiconductor |
χ |
V |
|
Electron current density |
Jn |
A/m2 |
|
Electron density |
n |
m-3 |
|
Electron density in thermal equilibrium |
n0 |
m-3 |
|
Electron density per unit energy and per unit volume |
n(E) |
m-3 |
|
Electron diffusion constant |
Dn |
m2/s |
|
Electron diffusion length |
Ln |
m |
|
Electron energy in vacumm |
Evacuum |
Joule |
|
Electron generation rate |
Gn |
m-3s-1 |
|
Electron lifetime |
τn |
s |
|
Electron mobility |
μn |
m2/V-s |
|
Electron recombination rate |
Rn |
m-3s-1 |
|
electronic charge |
q |
C |
|
Emitter doping density |
NE |
m-3 |
|
Emitter efficiency |
γE |
|
|
Emitter voltage |
VE |
V |
|
Emitter width |
wE |
m |
|
Energy |
E |
Joule |
|
Energy bandgap of a semiconductor |
Eg |
Joule |
|
Excess electron charge density in the base |
ΔQn,B |
C/m2 |
|
Excess electron density |
δ n |
m-3 |
|
Excess hole density |
δ p |
m-3 |
|
Fermi energy (thermal equilibrium) |
EF |
Joule |
|
Flatband capacitance per unit area of a MOS structure |
CFB |
F/m2 |
|
Flatband voltage |
VFB |
V |
|
Free electron mass |
m0 |
kg |
|
Gate voltage |
VG |
V |
|
Hole current density |
Jp |
A/m2 |
|
Hole density |
p |
m-3 |
|
Hole density in an n-type semiconductor |
pn |
m-3 |
|
Hole density in thermal equilibrium |
p0 |
m-3 |
|
Hole density per unit energy |
p(E) |
m-3 |
|
Hole diffusion constant |
Dp |
m2/s |
|
Hole diffusion length |
Lp |
m |
|
Hole generation rate |
Gp |
m-3s-1 |
|
Hole lifetime |
τp |
s |
|
Hole mobility |
μp |
m2/V-s |
|
Hole recombination rate |
Rp |
m-3s-1 |
|
Interface charge density per unit area |
QI |
C/m2 |
|
Intrinsic carrier density |
nI |
m-3 |
|
Intrinsic carrier density |
nI |
m-3 |
|
Intrinsic Fermi energy |
EI |
Joule |
|
Ionized acceptor density |
Na- |
m-3 |
|
Ionized donor density |
Nd+ |
m-3 |
|
Junction capacitance per unit area |
Cj |
F/m2 |
|
Junction depth |
xj |
m |
|
Length |
L |
m |
|
Mass |
m |
kg |
|
Mean free path |
l |
m |
|
Net recombination rate of electrons |
Un |
m-3s-1 |
|
Net recombination rate of holes |
Up |
m-3s-1 |
|
Oxide capacitance per unit area |
Cox |
F/m2 |
|
Oxide thickness |
tox |
m |
|
Plank's constant |
h |
Js |
|
Position |
x |
m |
|
Potential |
φ |
V |
|
Potential at the semiconductor surface |
φs |
V |
|
Quasi-Fermi energy of electrons |
Fn |
Joule |
|
Quasi-Fermi energy of holes |
Fp |
Joule |
|
Reduced Plank's constant (= h/2π) |
|
Js |
|
Resistance |
R |
Ω |
|
Resistivity |
ρ |
Ωm |
|
Speed of light in vacuum |
c |
m/s |
|
Temperature |
T |
Kelvin |
|
Thermal velocity |
vth |
m/s |
|
Thermal voltage |
Vt |
V |
|
Thickness |
t |
m |
|
Threshold voltage of an MOS structure |
VT |
V |
|
Transport factor |
α |
|
|
Valence band energy of a semiconductor |
Ev |
Joule |
|
Velocity |
v |
m/s |
|
Width of a p-type region |
wp |
m |
|
Width of an n-type region |
wn |
m |
|
Workfunction difference between the metal and the semiconductor |
ΦMS |
V |
|
Workfunction of the metal |
ΦM |
V |
|
Workfunction of the semiconductor |
ΦS |
V |